Cathodic arc deposition is a kind of physical vapor deposition method. It has the advantages of high ionization rate and high deposition rate. The structure of the coating system is shown in Figure (1), and working to promotes the plasma reaction on the target surface. At the same time, a cooling water pass through behind the target to reduce the temperature of molten pool from the ark, which makes the density of film better.

Figure(1) Cathodic Arc Evaporation

           This system uses the arc striking rod to hit the surface of the cathode target material to cause a short circuit and start the arc, which is generating a low voltage and high current arc discharge and forming a cathode arc spot on the surface of the cathode evaporation source. The cathodic arc spot will move quickly on the surface of the target material, causing the surface of the cathode evaporation source to form a molten state of micro-pits, and then evaporate the material. Therefore, there are gas ions or molecules of the cathode evaporation source in the plasma, as shown in Figure (2).